| 摘要 |
This invention relates to a kind of devices with trace emission resulted for treatment of exhaust gas. The device comprises a vessel having only one opening that serves as inlet. At least two gas exchange sections in sequence are provided inside the vessel after inlet of exhaust gas, between two gas exchange sections there is a gas mixture chamber at their connection part. The gas exchange chamber at first gas exchange section has a through opening leading to outside atmosphere area. With this configuration, on entering into the gas exchange section, exhaust gas will be ejected inwards and causes very strong entrainment, which makes the gas chamber become vacuum and sucks air with oxygen from atmosphere into gas chamber via the through opening to atmosphere. Formed high-pressure gas is burned furiously with combustible gas in the gas chamber at next stage, and the remaining exhaust gas is transferred into next gas exchange section with very high-speed revolution occurring on exhaust gas and momentum transfer. The higher negative pressure is, the more gas is consumed. In this way, the exhaust gas will be treated and only trace emission, even no emission, will be resulted.
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