发明名称 Method and apparatus for aberration-insensitive electron beam imaging
摘要 One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.
申请公布号 US7405402(B1) 申请公布日期 2008.07.29
申请号 US20060360930 申请日期 2006.02.22
申请人 KLA-TENCOR TECHNOLOGIES CORPORATION 发明人 VEDULA SRINIVAS;AZORDEGAN AMIR;HORDON LAURENCE;BRODIE ALAN D.;LORUSSO GIAN FRANCESCO;TADA TAKUJI
分类号 G01N23/00;G21K7/00;H01J3/14 主分类号 G01N23/00
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