发明名称 |
Method and apparatus for aberration-insensitive electron beam imaging |
摘要 |
One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.
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申请公布号 |
US7405402(B1) |
申请公布日期 |
2008.07.29 |
申请号 |
US20060360930 |
申请日期 |
2006.02.22 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
VEDULA SRINIVAS;AZORDEGAN AMIR;HORDON LAURENCE;BRODIE ALAN D.;LORUSSO GIAN FRANCESCO;TADA TAKUJI |
分类号 |
G01N23/00;G21K7/00;H01J3/14 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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