| 摘要 |
<p>Novel methods and additives for stabilizing one or more cyclotetrasiloxane compounds for use in silicon film deposition are described herein. The disclosed methods and additives may utilize silicon-containing compounds to inhibit polymerization of one or more cyclotetrasiloxanes. In an embodiment, a method of stabilizing one or more cyclotetrasiloxane compounds for use in silicon film deposition comprises adding one or more additives to the one or more cyclotetrasiloxane compounds to inhibit polymerization of the cyclotetrasiloxane compound. The one or more additives may comprise an acrylate, a methacrylate, or a silane compound having the formula (I): where R<SUP>1</SUP>-R<SUP>4</SUP> may each independently be an alkyl group, an alkoxy group, a heterocyclic group, an acryloxy group, a vinyl group, an epoxy group, a glycidyloxy group, or a hydrogen. R<SUP>1</SUP>-R<SUP>4</SUP> may be the same or different from each other. The one or more additives may also comprise combinations of the above mentioned compounds.</p> |
