| 摘要 |
A bath for semiconductor manufacturing equipment is provided to prevent process errors and defects by preventing separation of wafers and a breakdown due to collision. A bath(100) includes a constant space. Both ends of a wafer guide(200) are positioned at an upper end of the bath. A plurality of wafers are loaded in a constant interval into the wafer guide. A leveling unit is positioned at both ends of the wafer guide in order to perform a control operation for maintaining a constant level of the wafer guide. The leveling unit includes an elevator(400) for elevating the wafer guide, a level measurement device(410) connected electrically to the elevator in order to measure the level of the wafer guide, and a controller(420) connected electrically to the level measurement device in order to control operations of the elevator.
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