| 摘要 |
A method is provided for forming a monolithically integrated optical filter, for example, a Fabry-Perot filter, over a substrate ( 10 ). The method comprises forming a first mirror ( 16 ) over the substrate ( 10 ). A plurality of etalon material layers ( 32, 34, 36, 38 ) are formed over the mirror ( 16 ), and a plurality of etch stop layers ( 42, 44, 46 ) are formed, one each between adjacent etalon material layers ( 32, 34, 36, 38 ). A photoresist is patterned to create an opening ( 54 ) over the top etalon material layer ( 38 ) and an etch ( 56 ) is performed down to the top etch stop layer ( 46 ). An oxygen plasma ( 58 ) may be applied to convert the etch stop layer ( 46 ) within the opening ( 54 ) to silicon dioxide ( 57 ). The photoresist patterning, etching, and applying of an oxygen plasma may be repeated as desired to obtain the desired number of levels ( 82, 84, 86, 88 ). A second mirror ( 72 ) is then formed on each of the levels ( 82, 84, 86, 88 ).
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