发明名称 APPARATUS FOR SUPPORTING THE WAFER
摘要 <p>A substrate holding apparatus is provided to enhance productivity and to increase a yield by preventing generation of a wave pattern in a cell part. A pin includes one end thereof in order to support a substrate. A plate is formed to support the other end of the pin. A moving unit moves the pin. The moving unit includes a magnetic material(210) having the pin and an external member(220) of the pin for surrounding the magnetic material. The magnetic material has a rectangular shape. An upper surface of the plate is composed of a corrosion-resistant member. A lower surface of the plate is composed of a magnetic member.</p>
申请公布号 KR20080042392(A) 申请公布日期 2008.05.15
申请号 KR20060110740 申请日期 2006.11.09
申请人 SEMES CO., LTD. 发明人 PARK, JONG HO
分类号 H01L21/683;H01L21/304;H01L21/677;H01L21/687 主分类号 H01L21/683
代理机构 代理人
主权项
地址