| 发明名称 |
Nitrogen-containing organic compound, resist composition and patterning process |
| 摘要 |
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
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| 申请公布号 |
US2008102405(A1) |
申请公布日期 |
2008.05.01 |
| 申请号 |
US20070976426 |
申请日期 |
2007.10.24 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;OHSAWA YOUICHI;OHASHI MASAKI;KUSAKI WATARU;KOBAYASHI TOMOHIRO |
| 分类号 |
G03C1/00;C07D233/54;C07D235/04;C07D265/30;C07D417/02;G03C5/00 |
主分类号 |
G03C1/00 |
| 代理机构 |
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