发明名称 METHOD OF INSPECTING AN IDENTIFICATION MARK, METHOD OF INSPECTING A WAFER AND APPARATUS FOR INSPECTING A WAFER
摘要 An identification mark inspecting method is provided to almost avoid generation of an additional time interval by inspecting a defect of an identification mark formation region while using an image obtained for inspecting whether an identification mark is read. The image of an identification mark formed on a wafer is obtained(S110). The identification mark is read by using the image of the identification mark(S120). When the identification mark is read, a region where the identification mark is formed is inspected by using the image of the identification mark(S130). Whether the identification mark is read is determined according as the identification marks of the image are compared with predetermined reference identification marks and every reference identification mark match one of the reference identification marks.
申请公布号 KR100823698(B1) 申请公布日期 2008.04.21
申请号 KR20070019793 申请日期 2007.02.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KO, JAE KYUN;LIM, YOUNG KYU;PARK, JE KWON;KIM, HYUN HEE;LEE, KYU
分类号 H01L21/66 主分类号 H01L21/66
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