发明名称 |
LIGHT IRRADIATION APPARATUS, CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND DEVICE |
摘要 |
A light irradiation apparatus, a crystallization apparatus and method, and a device are provided to variably implement deep intensity suitable for properties of a material to be irradiated by changing a ratio of optical intensities of first and second illuminating lights. An optical converting device(1A) has a phase step of a phase difference different from 180 degrees. An illuminating optical system illuminates an illuminating light which is slanted in a direction perpendicular to a step line of the phase step. An image forming optical system(3) forms an optical intensity distribution based on the light phase-modulated by the optical converting device. The illuminating optical system illuminates a first illuminating light and a second illuminating light onto the optical converting device at the same time, and has an optical intensity setting member for setting optical intensity of the first illuminating light and optical intensity of the second illuminating light.
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申请公布号 |
KR20080026501(A) |
申请公布日期 |
2008.03.25 |
申请号 |
KR20070094668 |
申请日期 |
2007.09.18 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. |
发明人 |
YUKIO TANIGUCHI |
分类号 |
H01L21/268;G02B27/18 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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