发明名称 Non-volatile memory and method of fabricating the same
摘要 An electrically erasable programmable read-only memory (EEPROM) comprises trench isolation regions whose upper surfaces are recessed compared with an upper surface of the semiconductor substrate, thereby allowing use of all surfaces of a protrusion of the semiconductor substrate between the isolation regions, including the upper surface of the semiconductor substrate, as an active region. Accordingly, the performance of a memory cell can be improved by increasing the size of an active channel region without needing to change the size of a planar unit cell.
申请公布号 US7342280(B2) 申请公布日期 2008.03.11
申请号 US20050149396 申请日期 2005.06.09
申请人 发明人
分类号 H01L21/8247;H01L29/792;H01L21/8246;H01L27/115;H01L29/788 主分类号 H01L21/8247
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