| 摘要 |
<p>Novel technology for reducing of at least the former of oxidation of ruthenium film and carbon deposition on ruthenium film. There is provided an exposure apparatus for exposing of a substrate via an original plate with the use of exposure light, comprising reflecting means having a multilayer film capable of reflecting of exposure light and, superimposed thereon, a ruthenium film and adapted to reflect any exposure light; a vacuum vessel enclosing the reflecting means; evacuation means for evacuating of the interior of the vacuum vessel; detection means for detecting of the amount of vapor component in the vacuum vessel; feeding means for feeding of at least either water vapor or carbon vapor into the vacuum vessel; and control means for on the basis of the amount of vapor component detected by the detection means, controlling of the amount of at least either water vapor or carbon vapor fed by the feeding means so that in the vacuum vessel the amount of water vapor and amount of carbon vapor satisfy the predetermined relationship. ® KIPO & WIPO 2008</p> |
