发明名称 |
METHOD FOR PRODUCING SILICON FINE PARTICLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for efficiently producing silicon fine particles. SOLUTION: The method for producing silicon fine particles comprises forming silicon fine particles by pulverizing at least one portion of single crystal silicon by colliding oxide particles with the single crystal silicon by applying an ultrasonic wave to a dispersion containing the oxide particles and a dispersion medium while bringing the dispersion into contact with the single crystal silicon. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008019115(A) |
申请公布日期 |
2008.01.31 |
申请号 |
JP20060190785 |
申请日期 |
2006.07.11 |
申请人 |
CATALYSTS & CHEM IND CO LTD |
发明人 |
TAGUMA YUICHIRO;YOSHIDA OSAMU;NAKAJIMA AKIRA;KOMATSU MICHIO |
分类号 |
C01B33/02 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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