发明名称 SUBSTRATE TRAY AND FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate tray which prevents an evaporating material from sneaking into a part which has to be covered by a mask, and precisely forms a film with a predetermined pattern on a glass substrate, and to provide a film-forming apparatus therefor. SOLUTION: The substrate tray holds a substrate, is arranged so as to face a material source for the thin film, and comprises: a holding member that holds the substrate and has an aperture through which the particle of the material for the thin film to be deposited on the substrate after having departed from the material source for the thin film passes; the first mask which is arranged between the substrate and the hold member, and controls the thin film formed on the substrate into a predetermined shape, by shielding the particle of the material for the thin film, which has passed through the aperture, so as not to deposit on the substrate; and the second mask which is arranged between the first mask and the holding member, and covers at least one part of the first mask so as to prevent the particle of the material for the thin film from depositing on the first mask. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008013834(A) 申请公布日期 2008.01.24
申请号 JP20060188522 申请日期 2006.07.07
申请人 CANON ANELVA CORP 发明人 HAGI TOKIJI;HATAYAMA SHOJI;NISHIO KAZUTOSHI
分类号 C23C14/50;C23C14/04 主分类号 C23C14/50
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