| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, LAYERED PRODUCT THEREOF, CURED OBJECT THEREFROM, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION (2) |
| 摘要 |
<p>A photosensitive resin composition which can form a pattern having high resolution and a high aspect ratio and has high sensitivity. The photosensitive resin composition comprises one or more epoxy resins (A) selected among epoxy resins (A-1) having a biphenyl structure and polyfunctional epoxy resins (A-2), a polyfunctional bisphenol-A novolak epoxy resin (B), and a cationic photopolymerization initiator (C) which is sulfonium tris(pentafluoroethyl) trifluorophosphate.</p> |
| 申请公布号 |
WO2008007762(A1) |
申请公布日期 |
2008.01.17 |
| 申请号 |
WO2007JP63954 |
申请日期 |
2007.07.13 |
| 申请人 |
NIPPON KAYAKU KABUSHIKI KAISHA;MICROCHEM CORP.;SAKAI, RYO;MORI, SATOSHI;HONDA, NAO;JOHNSON, DONALD;MILLER, HARRIS |
发明人 |
SAKAI, RYO;MORI, SATOSHI;HONDA, NAO;JOHNSON, DONALD;MILLER, HARRIS |
| 分类号 |
C08G59/20;G03F7/029;G03F7/004;G03F7/032;G03F7/38;G03F7/40;H01L21/027 |
主分类号 |
C08G59/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
