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发明名称
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION
摘要
申请公布号
KR100795252(B1)
申请公布日期
2008.01.15
申请号
KR20067005036
申请日期
2006.03.10
申请人
发明人
分类号
G03F7/004;B41J2/16;C08G59/00;C08G59/68;G03F7/029;G03F7/038;G03F7/40
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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