发明名称 CMOS Devices Adapted to Prevent Latchup and Methods of Manufacturing the Same
摘要 In a first aspect, a first apparatus is provided. The first apparatus is a semiconductor device on a substrate that includes (1) a first metal-oxide-semiconductor field-effect transistor (MOSFET); (2) a second MOSFET coupled to the first MOSFET, wherein portions of the first and second MOSFETs form first and second bipolar junction transistors (BJTs) which are coupled into a loop; and (3) a conductive region that electrically couples a source diffusion region of the first or second MOSFET with a doped well region below the source diffusion region. The conductive region is adapted to prevent an induced current from forming in the loop. Numerous other aspects are provided.
申请公布号 US2008006855(A1) 申请公布日期 2008.01.10
申请号 US20060456357 申请日期 2006.07.10
申请人 MANDELMAN JACK A;TONTI WILLIAM R 发明人 MANDELMAN JACK A.;TONTI WILLIAM R.
分类号 H01L29/76 主分类号 H01L29/76
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