发明名称 FIN MASK AND METHOD FOR FABRICATING SADDLE TYPE FIN USING THE SAME
摘要 A fin mask for forming saddle type fins in each of active regions formed in an island shape having a certain size with a major axis and a minor axis includes a first fin mask of a line type, and a second fin mask of an island type, wherein the first fin mask and the second fin mask in combination expose saddle type fin regions and cover ends of the neighboring active regions along the major axis.
申请公布号 US2008003833(A1) 申请公布日期 2008.01.03
申请号 US20070679179 申请日期 2007.02.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM KWANG-OK
分类号 H01L21/336;H01L27/108 主分类号 H01L21/336
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