| 摘要 |
An array substrate for an LCD and a method for manufacturing the same are provided to manufacture the array substrate through a three-mask process, thereby decreasing the number of exposure masks. A gate line, a gate electrode, and a gate pad electrode(109) are formed on a substrate(101) through a first mask process. A gate insulating layer(115) is formed on the resultant substrate. An active layer of intrinsic amorphous silicon, an impurity-doped amorphous silicon pattern, and a metal pattern, a data line, and a data pad electrode are simultaneously formed on the gate insulating layer through a second mask process. A transparent conductive material layer is formed on the resultant substrate. The transparent conductive material layer, the metal pattern, and the impurity-doped amorphous silicon pattern are pattern-etched through a third mask process to form ohmic contact layers, source and drain electrodes, a pixel electrode connected to the drain electrode, a gate auxiliary pad electrode(153), and a data auxiliary pad electrode are formed. A passivation layer(165) is formed on the resultant substrate. |
