| 摘要 |
A method for manufacturing a poly crystalline silicon layer is provided to perform continuous laser irradiation processes, after coating a liquid silane, thereby reducing process time, and solving a substrate limitation problem because of a high temperature process. A silane polymer layer is formed by coating a liquid silane polymer(S1). An amorphous silicon layer is formed by irradiating a first laser to the silane polymer layer(S2). A poly crystalline silicon layer is formed by irradiating a second laser to the silane polymer layer(S3). The liquid silane polymer is a cyclopentane(C5H10).
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