X-RAY SOURCE,申请号EP20040811779-传众专利搜索

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发明名称	X-RAY SOURCE
摘要
申请公布号	EP1719150(B1)	申请公布日期	2007.12.26
申请号	EP20040811779	申请日期	2004.11.19
申请人	OSMIC, INC.	发明人	BONGLEA, KIM
分类号	H01J35/28;H01J35/14;H01J35/24	主分类号	H01J35/28
代理机构		代理人
主权项
地址

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