发明名称 HIGH-CLEANING, LOW ABRASION, HIGH BRIGHTNESS SILICA MATERIALS FOR DENTRIFICES
摘要 Unique abrasive materials that are in situ generated compositions of precipitated silicas and silica gels are provided. Such compositions exhibit different beneficial, particularly simultaneously high pellicle film cleaning properties and moderate dentin abrasion levels. Such a result thus accords the user a dentifrice that effectively cleans tooth surfaces without detrimentally abrading such surfaces. Furthermore, the produced abrasive materials also exhibit very high and desirable brightness properties that permit easy incorporation and utilization within dentifrices for aesthetic purposes. Encompassed within this invention is a unique method for making such gel/precipitated silica composite materials for such a purpose, particularly under high shear conditions, as well as the different materials within the structure ranges described above and dentifrices comprising such.
申请公布号 WO2007111867(A3) 申请公布日期 2007.12.06
申请号 WO2007US06835 申请日期 2007.03.20
申请人 J.M. HUBER CORPORATION;MCGILL, PATRICK, D. 发明人 MCGILL, PATRICK, D.
分类号 A61Q11/00;C01B33/12 主分类号 A61Q11/00
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