发明名称 EXPOSURE METHOD AND DEVICE FOR DIRECT DRAWING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To attain a high definition drawing while maintaining a spot at a certain intensity without using a microlens in exposure by a direct drawing system. <P>SOLUTION: The light rays from a light source is emitted to a DMD (11) that reflects light by the ON/OFF operation of each micromirror; the light rays reflected on the DMD is image-formed through a first optical system (12) and split into three beams by a tripartite mirror 20 disposed on the imaging plane by the first optical system, in a direction approximately perpendicular to the imaging direction by the light from the DMD; and the divided beam is reduced by a second optical system (16) as well as imaged onto a drawing plane (17). <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007304517(A) 申请公布日期 2007.11.22
申请号 JP20060135610 申请日期 2006.05.15
申请人 SHINKO ELECTRIC IND CO LTD 发明人 NAKAI JUICHI
分类号 G03F7/20 主分类号 G03F7/20
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