| 摘要 |
<p>Provided are a projection exposure device and a projection exposure method capable of positioning a substrate at an appropriate position without using a position measuring device such as an interferometer for measuring the position of a stage. According to a position of a reference substrate reference mark formed on a reference substrate, table position correction data is calculated for correcting an error of the position of the table. According to the table position correction data and the position of the exposure substrate reference mark formed on the exposure substrate, linear error correction data is calculated for correcting the error of the linear component of the position of the exposure substrate reference mark by using the method of least squares.</p> |
