| 摘要 |
<p>Separation of zirconium- and hafnium compound comprises subjecting a mixture containing a hafnium compound (I) and zirconium compound (II), which contains a carbon atom, to fractional crystallization. Separation of zirconium- and hafnium compound comprises subjecting a mixture containing a hafnium compound (I) of formula (HfR 4) and zirconium compound (II) of formula (ZrR 4), which contains a carbon atom, to fractional crystallization. R : organic residue (optionally containing one or more heteroatoms). An independent claim is included for a hafnium compound obtained by the process.</p> |
