发明名称 |
Photosensitive resin composition |
摘要 |
A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200'000 or less, (B) selected alpha-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.
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申请公布号 |
US2007259278(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070818073 |
申请日期 |
2007.06.13 |
申请人 |
KURA HISATOSHI;OKA HIDETAKA;OHWA MASAKI |
发明人 |
KURA HISATOSHI;OKA HIDETAKA;OHWA MASAKI |
分类号 |
G02B5/00;C08F2/50;G02B5/20;G03F7/00;G03F7/004;G03F7/031;H01L21/027;H01L51/50;H05B33/10 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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