ION BEAM SCANNING CONTROL METHODS AND SYSTEMS FOR ION IMPLANTATION UNIFORMITY
摘要
One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.
申请公布号
WO2007120623(A2)
申请公布日期
2007.10.25
申请号
WO2007US08784
申请日期
2007.04.10
申请人
AXCELIS TECHNOLOGIES, INC.;BENVENISTE, VISTOR;EISNER, EDWARD;VANDERBERG, BO