发明名称 PATTERN INSPECTION METHOD AND MANUFACTURING METHOD OF MASK
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern inspection method which classifies patterns for every shape and sorts out a representative pattern automatically, by extracting a dangerous pattern which has large difference in a shape between the design data of a mask and optical proximity effect correction data, and to provide a manufacturing method of the mask. <P>SOLUTION: A region to be verified is divided into two or more small regions. In the respective two or more small regions, a coordinate value of a danger point where the shape difference between the both exceeds a first allowance is extracted by comparing a pattern used as a target with a pattern to be inspected. Among the coordinate values of the extracted danger point, the coordinate values are deleted in a circumference of the two or more of the small regions. The patterns in the coordinate value of the danger point which remain after the deleting are extracted as dangerous patterns from the patterns which serve as targets. By this way, there is provided the pattern inspection method for extracting a mutually different pattern among the dangerous patterns as representative patterns. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007266391(A) 申请公布日期 2007.10.11
申请号 JP20060090591 申请日期 2006.03.29
申请人 TOSHIBA CORP 发明人 OKUDA KENTARO;KANEZASHI YASUO;TANIZAKI HIROYUKI
分类号 H01L21/027;G03F1/36;G03F1/84 主分类号 H01L21/027
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