发明名称 FILM FORMING APPARATUS
摘要 A film forming apparatus is provided to extend a lifetime of a plasma gun by preventing electrons from colliding with one another inside cathode, grid, and anode electrodes. A film forming apparatus includes a vacuum chamber, a hearth, and a plasma gun. The hearth is arranged inside the vacuum chamber and receives a film source. The plasma gun is arranged inside the vacuum chamber and irradiates electrons into the vacuum chamber. The plasma gun includes a cathode electrode(31), a grid electrode, and an anode electrode(34). The cathode electrode includes a first electrode hole for generating an electron flow. The grid electrode includes a second hole, which is coupled with the first hole for accelerating the electrons. The anode electrode includes a third hole, which is coupled with the second hole for irradiating the electrons on the film source. At least one of the electrodes includes a surface which is slanted with respect to an electron flow direction.
申请公布号 KR20070097709(A) 申请公布日期 2007.10.05
申请号 KR20060028292 申请日期 2006.03.29
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, JIN PIL;CHOI, YONG SUP;LEE, KANG IL
分类号 H01J37/32 主分类号 H01J37/32
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