| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polymerizable monomer having a high transparency and a low refraction index in such a wide wavelength range as from a vacuum ultraviolet ray to an optical communication wavelength area and further having high adhesion to substrates, high film-forming property and high etching resistance, which can be attained by allowing a polar group to contain in the same molecule even under a high fluorine content, and to provide a polymer compound using the monomer. <P>SOLUTION: The polymerizable monomer represented by formula (1) [wherein, R<SB>1</SB>and R<SB>2</SB>are CH<SB>3</SB>or CF<SB>3</SB>; and R<SB>3</SB>and R<SB>4</SB>are a hydrogen atom, a straight chain, branched or cyclic (fluorinated) 1-25C alkyl group, a cyclic body containing an aromatic ring, or an acid removed group], a method for producing the monomer, a polymer compound obtained by homopolymerization using the monomer, and further an anti-reflection material or a resist material, using the polymer compound, are provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
