发明名称 |
APPARATUS AND METHOD FOR CARRYING SUBSTRATES |
摘要 |
The present invention provides a method and an apparatus for carrying at least one substrate for plasma processing. The method and apparatus comprising a carrier for transporting the substrate, that is located unbonded on the carrier, onto a substrate support within a plasma system for plasma processing. An electrostatic clamp, that is coupled to the substrate support, electrostatically secures the substrate to the substrate support through the carrier during plasma processing. |
申请公布号 |
WO2007109448(A2) |
申请公布日期 |
2007.09.27 |
申请号 |
WO2007US63794 |
申请日期 |
2007.03.12 |
申请人 |
OERLIKON USA, INC.;JOHNSON, DAVID;LAI, SHOULIANG |
发明人 |
JOHNSON, DAVID;LAI, SHOULIANG |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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