发明名称 APPARATUS AND METHOD FOR CARRYING SUBSTRATES
摘要 The present invention provides a method and an apparatus for carrying at least one substrate for plasma processing. The method and apparatus comprising a carrier for transporting the substrate, that is located unbonded on the carrier, onto a substrate support within a plasma system for plasma processing. An electrostatic clamp, that is coupled to the substrate support, electrostatically secures the substrate to the substrate support through the carrier during plasma processing.
申请公布号 WO2007109448(A2) 申请公布日期 2007.09.27
申请号 WO2007US63794 申请日期 2007.03.12
申请人 OERLIKON USA, INC.;JOHNSON, DAVID;LAI, SHOULIANG 发明人 JOHNSON, DAVID;LAI, SHOULIANG
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
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