发明名称 METHOD OF MANUFACTURING ELECTRONIC COMPONENT
摘要 PROBLEM TO BE SOLVED: To provide a method for reducing occurrence of non-deposition or defect of a plating film after electrolytic plating by suppressing the dissolution of a seed film. SOLUTION: A method of manufacturing an electronic component includes: a seed film forming step (S110) of forming a seed film on a substrate; a cooling step (S112) of cooling the seed film; and a plating step (S114) of immersing the cooled seed film in a plating liquid, and performing electrolytic plating using the seed film as a cathode. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007227819(A) 申请公布日期 2007.09.06
申请号 JP20060049523 申请日期 2006.02.27
申请人 TOSHIBA CORP 发明人 TOYODA HIROSHI;HASUNUMA MASAHIKO
分类号 H01L21/288;C25D7/12;C25D21/12;H01L21/28;H01L21/3205;H01L23/52 主分类号 H01L21/288
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