发明名称 |
METHOD OF MANUFACTURING ELECTRONIC COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for reducing occurrence of non-deposition or defect of a plating film after electrolytic plating by suppressing the dissolution of a seed film. SOLUTION: A method of manufacturing an electronic component includes: a seed film forming step (S110) of forming a seed film on a substrate; a cooling step (S112) of cooling the seed film; and a plating step (S114) of immersing the cooled seed film in a plating liquid, and performing electrolytic plating using the seed film as a cathode. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007227819(A) |
申请公布日期 |
2007.09.06 |
申请号 |
JP20060049523 |
申请日期 |
2006.02.27 |
申请人 |
TOSHIBA CORP |
发明人 |
TOYODA HIROSHI;HASUNUMA MASAHIKO |
分类号 |
H01L21/288;C25D7/12;C25D21/12;H01L21/28;H01L21/3205;H01L23/52 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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