| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for photo spacers having good alkali developability and giving a cured product having good flexibility and excellent elastic recovery property. <P>SOLUTION: The alkali developable photosensitive resin composition (Q) for photo spacers contains a hydrophilic polymer (A), a polyfunctional (meth)acrylate monomer (B), a silane compound (C) having three or four hydrolyzable alkoxy groups represented by the formula (1): R<SP>1</SP><SB>m</SB>Si(OR<SP>2</SP>)<SB>4-m</SB>(wherein R<SP>1</SP>is a 1-12C aliphatic saturated hydrocarbon group or a 6-18C aromatic hydrocarbon group; R<SP>2</SP>is a 1-4C alkyl group; and (m) is 0 or 1), a photo-radical polymerization initiator (D) and a photoacid generator (E). <P>COPYRIGHT: (C)2007,JPO&INPIT |
