EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (EX) is comprised of a projecting optical system (PL) for forming an image of a first pattern on a first exposing region (AR1) and an image of a second pattern on a second exposing region (AR2), an adjusting device for adjusting plane positions between a first image surface (IS1) and a surface of a substrate (P), and ones between a second image surface (IS2) and the surface of the substrate (P), when a shot region on the substrate (P) is multi-exposed with the images of the first and second patterns through the projecting optical system (PL). The substrate can be efficiently well multi-exposed.