Thermally developable materials with buried conductive backside coatings

摘要

Thermally developable materials including photothermographic and thermographic materials having a buried conductive backside layer comprising one or more binder polymers, and an antistatic compound that is an organic solvent soluble alkali metal salt of any of a perfluorinated aliphatic carboxylic acid having 2 or 3 carbon atoms, a perfluorinated aliphatic sulfonate, or a tetrafluoroborate, provide antistatic coatings that exhibit little dependence on humidity.