Two-stage process to dope a semiconductor by atomization of alcoholized droplets followed by heating

摘要

In a two-stage process to dope a semiconductor, a titanium dioxide nano-structure layer is applied to a metal substrate of e.g. titanium and simultaneously doped with carbon. In the first stage an alcoholic solution of metal salts is atomized and directed onto a heated and temperature-controlled substrate, where it is hydrolized by controlled exposure to water vapor. The alcoholized droplets incorporate an organic substance e.g. glucose that dopes the semiconductor on second-stage heating.