<p>Disclosed is a method for producing a film-forming material wherein a metal compound (W) having two or more isocyanate groups is dissolved in a solvent (S). Specifically, the method for producing a film-forming material comprises a step for removing isocyanic acid in a solution (R1) which is obtained by dissolving the metal compound (W) in the solvent (S), and a step for filtering the solution (R1) in an inert gas atmosphere after the removal of isocyanic acid.</p>
申请公布号
WO2007091569(A1)
申请公布日期
2007.08.16
申请号
WO2007JP52051
申请日期
2007.02.06
申请人
TOKYO OHKA KOGYO CO., LTD.;RIKEN;MATSUMARU, SHOGO;DAZAI, TAKAHIRO;HADA, HIDEO;FUJIKAWA, SHIGENORI;KUNITAKE, TOYOKI
