发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 The aperture ratio of a pixel of a reflecting type display device is improved without increasing the number of masks and without using a black mask. Locations for light shielding between pixels are arranged such that a pixel electrode overlaps with a portion of a gate wiring and a source wiring. In locations for shielding TFTs, a high pixel aperture ratio is realized by forming a color filter (red, or lamination of red and blue), formed on an opposing substrate.
申请公布号 US2007184665(A1) 申请公布日期 2007.08.09
申请号 US20070695159 申请日期 2007.04.02
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KOYAMA JUN
分类号 H01L21/302;G02F1/1335;G02F1/1362;H01L21/336;H01L21/461;H01L21/77;H01L27/12;H01L27/13;H01L29/786 主分类号 H01L21/302
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