发明名称 NONVOLATILE MEMORY DEVICE, AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device capable of operating more stably. SOLUTION: The device comprises a source region formed in a semiconductor substrate, a gate insulating film formed so as to overlap with part of the source region, a floating gate having a structure for forming an electric field constantly in a region that overlaps with the source region and formed on the upper part of the gate insulating film, a control gate formed in an insulating state along one sidewall of the floating gate from the upper part of the floating gate, an insulating film between gates interposed between the floating gate and the control gate, and a drain region formed adjacent to the other side of the control gate. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194638(A) 申请公布日期 2007.08.02
申请号 JP20070010593 申请日期 2007.01.19
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 MOON JUNG-HO;KWON CHUL-SOON;YU JAE-MIN;PARK JAE-HYUN;JEONG YOUNG-CHEON;YOON IN-GU
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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