SUBSTRATE ALIGN EQUIPMENT USING CIRCULAR MOIRE PATTERNS FOR NANO-IMPRINT PROCESS

摘要

A substrate aligning apparatus using circular moire in a nano-imprinting process is provided to accurately deposit a pattern of a mask on a substrate by analyzing moire pattern and thus calculating an error value. An error detecting system(10) forms at least two lattices which have different diameter and are arranged in a concentric type on a mask and a wafer, in which a mask lattice(20) and a wafer lattice(30) are overlapped to form moire patterns. The mask lattices and the wafer lattices are photographed to obtain the circular moire patterns. The obtained circular moire patterns are analyzed by using mathematic algorithm to calculate an error value. The mask lattice and the wafer lattice have different pitches.