CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY

摘要

A CVD apparatus for a flat display is provided to shorten a time required to adjust an initial process value by measuring a height of a susceptor and judging a horizontal posture of the susceptor. A gas distribution plate(17) is connected to an upper portion of a chamber(10) to inject a gas into the chamber if a power is applied. A susceptor(30) is spaced apart from the gas distribution plate, and is moved up and down relative to the gas distribution plate, in which a flat display is loaded on an upper surface of the susceptor. Plural height measuring units(50) are provided in the chamber to measure a lifted height of the susceptor. A controller judges whether the susceptor is positioned in a horizontal posture.