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发明名称
Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle
摘要
申请公布号
DE19781667(B4)
申请公布日期
2007.07.05
申请号
DE19971081667
申请日期
1997.03.04
申请人
TOKYO ELECTRON LTD.
发明人
ASHTIANI, KAIHAN
分类号
H05H1/46;C23C16/00;C23C16/50;C23C16/505;C23C16/507;H01J37/32;H01L21/205;H01L21/302;H01L21/31;H05H1/24
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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