| 摘要 |
PROBLEM TO BE SOLVED: To provide a material gas supply apparatus which can uniformly supply material gas to whole regions of a substrate in a state where increase of an area of the whole apparatus is suppressed, even if the substrate with the larger area is an object. SOLUTION: Material gas supplied from gas supply piping 104 is introduced to an introduction pipe 131. Material gas introduced to the introduction pipe 131 is introduced to a diffusion relay pipe 132 of an introduction pipe 131-side through a communicating pipe 135. Material gas introduced to the diffusion relay pipe 132 is introduced to a central diffusion relay pipe 132 through a communicating part 136, and is introduced to a diffusion relay pipe 132 of a gas discharge pipe 133-side through a communicating part 137. Material gas via the diffusion relay pipe 132 is introduced to a gas discharge pipe 133 through a communicating part 138, is discharged to a side of the substrate W in a deposition room 101 from the gas discharge port 134, and is supplied onto the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
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