| 摘要 |
The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a plurality of optical elements such as lenses (L 5 ) and enabling a reticle that can be arranged in an object plane of the projection objective to be imaged onto a light-sensitive surface ( 26 ) that can be arranged in an image plane of the projection objective and is applied to a carrier ( 30 ). The inventive system is also provided with an immersion device between an image-side last optical element (L 5 ) of the projection objective and the light-sensitive surface ( 26 ), for introducing an immersion liquid ( 34 ) into an immersion chamber ( 50 ). Said immersion device comprises means ( 44; 66 ) which can prevent the appearance of gas bubbles ( 48 ) in the immersion liquid ( 34 ), affecting the imaging quality, and/or can remove existing gas bubbles ( 48 ). Said means can be, for example, an ultrasound source ( 66 ) or a degasifier ( 44 ).
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