CLEANING SOLUTION FOR SEMICONDUCTOR DEVICE OR DISPLAY DEVICE, AND CLEANING METHOD

摘要

Disclosed is a cleaning solution for semiconductor devices or display devices which is characterized by containing a polyamine of a specific structure having two or more amino groups in adjacent positions of a carbon chain or a salt of such a polyamine. Also disclosed is a method for cleaning a semiconductor device or a display device by using such a cleaning solution. This cleaning solution for semiconductor devices or display devices is highly safe and places little burden on the environment. The cleaning solution is capable of easily removing etching residues on a semiconductor substrate in a short time, and does not erode the wiring material at all, thereby enabling a fine processing. In addition, the cleaning solution can be rinsed with water only without requiring an organic solvent such as alcohol for rinsing. By employing such a cleaning method, burden on the environment can be extremely little in production of a semiconductor device or a display device, and a high-precision, high-quality circuit wiring can be extremely advantageously produced commercially.