| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method for patterning in any place on a substrate and capable of being applied even when a patterning area is large or a substrate is flexible, and to provide a patterning device and a display element by the patterning method. SOLUTION: A new patterning method is employed, which is characterized in that at least a substrate and a dispersion system are used, a distribution of particle concentration is produced in a layer of the dispersion system formed on the substrate by a distribution of heat quantity given to the dispersion system, and then subjected to a curing process. COPYRIGHT: (C)2007,JPO&INPIT |
