发明名称 |
Apparatus and method for containing immersion liquid in immersion lithography |
摘要 |
Immersion liquid is contained in the immersion area located between the last optical member of a projection system and a surface that is the subject of exposure by providing a liquid seal located adjacent to the immersion area. The liquid seal extends between the surface to be exposed and a seal-holding-surface located adjacent to the immersion area. The liquid seal is a seal-forming-liquid that is different from the immersion liquid and that is maintained in place between the surface to be exposed and the seal-holding-surface only by surface tension.
|
申请公布号 |
US2007126999(A1) |
申请公布日期 |
2007.06.07 |
申请号 |
US20060601771 |
申请日期 |
2006.11.20 |
申请人 |
NIKON CORPORATION |
发明人 |
POON ALEX K.T.;KHO LEONARD W.F.;KESWANI GAURAV |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|