发明名称 DRYING FURNACE FOR COATING FILM
摘要 <p>In drying of a glass substrate to which a coated film is applied, the heating and drying is conducted while feeding means 10, 18, which always moves on a lower surface of the glass substrate 6 to which the coated film is applied, abuts against the substrate, in order to solve a problem that when the lower surface of the coated film is supported for a long time, supporting traces occur and thereby quality of the glass substrate is reduced. With this configuration, traces of the pin 11, 12, 21 are less likely to occur.</p>
申请公布号 KR20070053714(A) 申请公布日期 2007.05.25
申请号 KR20077004085 申请日期 2005.08.22
申请人 KABUSHIKI KAISHA ISHII HYOKI 发明人 NAKANO TERUYUKI;KOZAWA YASUHIRO
分类号 B05C9/14;F26B3/28;F26B9/06;H01L21/027 主分类号 B05C9/14
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