METHOD OF FORMING SILICON NITRIDE FILM AND SYSTEM FOR CARRYING OUT THE SAME,申请号KR20060104505-传众专利搜索

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发明名称	METHOD OF FORMING SILICON NITRIDE FILM AND SYSTEM FOR CARRYING OUT THE SAME
摘要
申请公布号	KR100720778(B1)	申请公布日期	2007.05.23
申请号	KR20060104505	申请日期	2006.10.26
申请人		发明人
分类号	H01L21/205;H01L21/314;H01L21/316;H01L21/318	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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