| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring apparatus which can accurately measure an aberration of an optical system to be tested. <P>SOLUTION: The measuring apparatus is used for an exposure apparatus which uses an exposing light from a light source to expose an object to be exposed through an optical system, and it measures a wavefront aberration of the optical system. It is provided with a light source device which generates two kinds of non-exposing lights with wavelength areas different from that of the exposing light, and a memory which stores a corresponding relationship between a first measuring result of the optical system obtained by using the exposing light and a second measuring result of the optical system obtained by using the two kinds of non-exposing lights. <P>COPYRIGHT: (C)2007,JPO&INPIT |
