| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a control method which can achieve automatic matching, without falling into a loop condition even when the impedance of a plasma treatment chamber (load) fluctuates widely at plasma ignition or the like. <P>SOLUTION: When the deflection of a reflection factor at the same preset position of a slug tuner is a predetermined value or greater, it is determined that the impedance of the plasma treating chamber (load) fluctuates widely, so that information of a reflection factor best position, having lost reproducibility before the load fluctuation, is reset, and information at the present time is set as a new best position of reflection factor. This allows the automatic matching to follow the load fluctuating one after another, without making control of the automatic matching fall into the loop condition. <P>COPYRIGHT: (C)2007,JPO&INPIT |
